Hydrofluoric acid

hydrofluoric acid

Applications:

Due to its ability to dissolve oxides, hydrofluoric acid plays an important role in the purification of aluminum and uranium. Hydrofluoric acid is also used to etch glass, engraving patterns, marking scales and characters; the semiconductor industry uses it to remove oxides on the surface of silicon, and it can be used in refineries for the alkylation reaction of isobutane and n-butene Catalyst, hydrofluoric acid is also used in the "pickling" process that removes oxygen-containing impurities from the surface of stainless steel. Hydrofluoric acid is also used in the synthesis of various fluorine-containing organic compounds, such as Teflon (polytetrafluoroethylene) and refrigerants such as Freon.



Precautions:

Store in a cool, ventilated warehouse. Keep away from fire and heat sources. The storage temperature should not exceed 30°C, and the relative humidity should not exceed 85%. Keep container tightly closed. It should be stored separately from alkalis, active metal powders, and glass products, and should not be mixed. The storage area should be equipped with leakage emergency treatment equipment and suitable containment materials. Monitoring method: ion selective electrode method; fluorine reagent-lanthanum salt colorimetric method.